Fein Optic M46 Semiconductor Wafer Inspection Microscope with Reflected Light

The Fein Optic M46 metallurgical microscope is designed for semiconductor wafer inspection. This inspection microscope provides brightfield, darkfield reflected light microscopy and has a 6" stage.

Objective Lenses: Infinity Corrected Optical System objective lenses have the following specifications:
- Infinity Corrected LWD BD Plan Achromat 5x, NA = 0.15, WD = 9.0mm
- Infinity Corrected LWD BD Plan Achromat 10x, NA = 0.30, WD = 9.0mm
- Infinity Corrected LWD BD Plan Achromat 20x, NA = 0.45, WD = 3.4mm
- Infinity Corrected LWD BD Plan Achromat 50x, NA = 0.55, WD = 7.5mm
Viewing Head: Ergonomic tilting trinocular head with adjustable angle from 5º to 35º. Viewing head produces erect image. Splitting ratio: 100:0 or 0:100. Interpupillary distance adjustable from 50mm-76mm. C-mount adapter not included but is available for purchase separately.
Eyepieces: High eyepoint WF PL10x/22mm, with reticle retaining ring for a 26mm reticle.
Nosepiece: Quintuple brightfield /darkfield nosepiece with DIC slot.
Total Magnification: 50x, 100x, 200, 500x
Specimen Stage: 6" three layer mechanical stage with low position coaxial adjustment. 6" wafer holder is included. Stage travel range: 158mm x 158mm. Has clutch handle for quick movement.
Illumination: 10W LED BD reflected illuminator with electronic variable aperture and field diaphragm, center adjustable with switch for changing from brightfield to darkfield. Has slots for filters and polarizer.
Polarization: Includes 360º rotatable analyzer with polarizer for reflected light.
Focusing: Low position coaxial focus mechanism, coarse range: 33mm, fine precision: 0.001mm. Upper limit and tension adjustment.
Size: 523mm (20.59") D x 467.3mm (18.39") H x 465mm (18.30") W

View the M46 brochure.
View the M46 datasheet.