M46 Semiconductor Wafer Inspection Reflected Light Microscope

The Fein Optic M46 metallurgical microscope is designed for semiconductor wafer inspection. This inspection microscope provides brightfield, darkfield reflected light microscopy and has a 6" stage.

• Objective Lenses: Infinity Corrected Optical System objective lenses have the following specifications:
  • Infinity Corrected LWD BD Plan Achromat 5x, NA = 0.15, WD = 9.0mm
  • Infinity Corrected LWD BD Plan Achromat 10x, NA = 0.30, WD = 9.0mm
  • Infinity Corrected LWD BD Plan Achromat 20x, NA = 0.45, WD = 3.4mm
  • Infinity Corrected LWD BD Plan Achromat 50x, NA = 0.55, WD = 7.5mm
• Viewing Head: Ergonomic tilting trinocular head with adjustable angle from 5º to 35º. Viewing head produces erect image. Splitting ratio: 100:0 or 0:100. Interpupillary distance adjustable from 50mm-76mm. C-mount adapter not included but is available for purchase separately.
• Eyepieces: High eyepoint WF PL10x/22mm, with reticle retaining ring for a 26mm reticle.
• Nosepiece: Quintuple brightfield /darkfield nosepiece with DIC slot.
• Total Magnification: 50x, 100x, 200, 500x
• Specimen Stage: 6" three layer mechanical stage with low position coaxial adjustment. 6" wafer holder is included. Stage travel range: 158mm x 158mm. Has clutch handle for quick movement.
• Illumination: 10W LED BD reflected illuminator with electronic variable aperture and field diaphragm, center adjustable with switch for changing from brightfield to darkfield. Has slots for filters and polarizer.
• Polarization: Includes 360º rotatable analyzer with polarizer for reflected light.
• Focusing: Low position coaxial focus mechanism, coarse range: 33mm, fine precision: 0.001mm. Upper limit and tension adjustment.
• Size: 523mm (20.59") D x 467.3mm (18.39") H x 465mm (18.30") W

View the M46 brochure
View the M46 datasheet