Fein Optic M40X Semiconductor Wafer Inspection Microscope

The Fein Optic M40X metallurgical microscope provides brightfield and darkfield, polarized light and Nomarski DIC. It features a sturdy all metal frame and large flat base that accommodates larger size samples and is ideal for semiconductor wafer inspection.

• Objective Lenses: Choose from DIN Infinity Corrected Optical System (ICOS) metallurgical objective lens sets:
  • LWD Brightfield Plan Achromat 5x, 10x, 20x, 50x, 100x
  • High Resolution Brightfield Semi Apo 5x, 10x, 20x, 50x, 100x
  • LWD BD Achromat 5x, 10x, 20x, 50x, 100x
  • BD Plan Achromat 5x, 10x, 20x, 50x, 100x
  • High Resolution BD Semi Apo  5x ,10x ,20x ,50x, 100x
• Viewing Head: Trinocular viewing head, erect image. Eyetubes inclined at 25°, beam splitter ratio 100:0, 0:100. The interpupillary distance is adjustable between 50mm - 75mm.
• Eyepieces: WF10x/22 high eyepoint plan eyepieces, diopter adjustable. Accepts a 26mm reticle.
• Frame: Brightfield model allows for brightfield, polarized light, and Nomarski DIC. Brightfield/Darkfield model allows for brightfield, darkfield, polarized light, and Nomarski DIC. Switch to change between brightfield and darkfield.
• Nosepiece: Quintuple nosepiece for brightfield with DIC slot or for brightfield, darkfield with DIC slot.
• Total Magnification: 50x, 100x, 200, 500x, 1000x.
• Specimen Stage: Large flat base 320mm x 260mm x 16mm. 
• Illumination: High intensity LED fiber optic illuminator with on board thermal sensors, 80W, 25,000 hours lifetime, auto voltage sensing power supply 96-264VAC, 50-60Hz.
• Polarization: includes polarizer for reflected light and 360º rotatable analyzer.
• Focusing: Coaxial coarse and fine adjustment. Coarse adjustment distance 32mm with precision of fine adjustment 0.002mm. Tension adjustment to prevent drifting.
• Size: 523mm (20.59") D x 468mm (18.42") H x 465mm (18.30") W

View the M40X brochure.